Extremum seeking control of retention for a microparticulate system

Favache, Audrey;Dochain, Denis;Perrier, Michel;Guay, Martin
(2006) IEEE Workshop on Advanced Process Control for Industry (APC 2006) — Location: Vancouver, Canada

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  • Favache, Audreyorcid-logoUCLouvain
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  • Dochain, DenisUCLouvain
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  • Perrier, MichelUCLouvain
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  • Guay, Martin
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Favache, A., Dochain, D., Perrier, M., & Guay, M. (2006). Extremum seeking control of retention for a microparticulate system. Proceedings, p. CdRom paper WA1. https://hdl.handle.net/2078.5/229758