In-situ study of the effect of internal stress on the hydriding kinetics of Pd-based thin film systems
(2010) 12th International Conference on Modern Materials and Technologies — Location: Montecatini Terme, Italy
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- Abstract
- The effect of pre-existing internal stresses on the hydriding kinetics of Pd thin films has been studied. An innovative way of increasing H-loading beyond the intrinsic thermodynamic and kinetic limits is to pre-strain the metallic alloy, allowing for more atomic H to find its way in the host crystal lattice. Our cantilevered thin film samples have been deposited using a PVD technique. The evolution of their curvature during the deposition process has been measured with a high resolution in-situ diagnostic tool, which continuously monitors the reflection of multiple laser beams coming off the sample surface [1]. The hydriding kinetics of the Pd films has also been studied by monitoring the evolution of their curvature in real time. The rate-limiting steps have been identified by comparing our results with a classical two-step hydriding model already developed in a previous study [2]. Relevant kinetic and thermodynamic parameters have been calculated from our experimental data. The effect of the internal stress on the hydriding kinetics will be discussed as well.
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Delmelle, R., Michotte, S., & Proost, J. (2010). In-situ study of the effect of internal stress on the hydriding kinetics of Pd-based thin film systems. 12th International Conference on Modern Materials and Technologies, Montecatini Terme, Italy.