Degradation of bare and silanized silicon wafer surfaces by constituents of biological fluids
(2012) Journal of Colloid and Interface Science — Vol. 378, p. 77-82 (2012)
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- The 24 h stability of bare silicon wafers as such or silanized with CH 3O-(CH 2-CH 2-O) n -C 3H 6-trichlorosilane (n = 6-9) was investigated in water, NaCl, phosphate and carbonate solutions, and in phosphate buffered saline (PBS) at 37 °C (close to biological conditions regarding temperature, high ionic strength, and pH). The resulting surfaces were analyzed using ellipsometry, X-ray Reflectometry (XRR), X-ray Photoelectron Spectroscopy (XPS), and Atomic Force Microscopy (AFM). Incubation of the silanized wafers in phosphate solution and PBS provokes a detachment of the silane layer. This is due to a hydrolysis of Si-O bonds which is favored by the action of phosphate, also responsible for a corrosion of non-silanized wafers. The surface alteration (detachment of silane layer and corrosion of the non-silanized wafer) is also important with carbonate solution, due to a higher pH (8.3). The protection of the silicon oxide layer brought by silane against the action of the salts is noticeable for phosphate but not for carbonate. © 2012 Elsevier Inc. All rights reserved.
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Dekeyser, C., Buron, C. C., Derclaye, S., Jonas, A., Marchand-Brynaert, J., & Rouxhet, P. (2012). Degradation of bare and silanized silicon wafer surfaces by constituents of biological fluids. Journal of Colloid and Interface Science, 378, 77-82. https://doi.org/10.1016/j.jcis.2012.04.022 (Original work published 2012)