Nanolithographic patterning of thin metal films with a scanning probe microscope.
(1998) Superlattices and Microstructures — Vol. 24, n° 1, p. 79-82 (1998)
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- Abstract
- Using an atomic force microscope (AFM) operating in air, we locally modify thin films of e-beam-deposited Cr and Ti by applying voltage pulses between the AFM tip and the sample, which is positively biased with respect to the tip. The modifications consist in anodization and/or mechanical deformation and reach the metal/substrate interface. Metallic gates can thus be fabricated without pattern transfer. (C) 1998 Academic Press.
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Citations
Melinte, S., Nysten, B., & Bayot, V. (1998). Nanolithographic patterning of thin metal films with a scanning probe microscope. Superlattices and Microstructures, 24(1), 79-82. https://doi.org/10.1006/spmi.1996.0272 (Original work published 1998)