Effect of dopants on the dissolution behaviour of silicon substrates in HF-based cleaning solutions
(2006) 8th International Symposium on Ultra-Clean Processing of Semiconductor Surfaces — Location: Antwerp (2006)
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Abu Jeriban, S., Guiot, I., Bacherius, L., Proost, J., Vos, R., & Mertens, P. (2006). Effect of dopants on the dissolution behaviour of silicon substrates in HF-based cleaning solutions. Proceedings, p. 125. https://hdl.handle.net/2078.5/223033