Application of process induced stress to study the mechanical properties of monocrystalline and amorphous silicon thin films

Passi, Vikram;Bhaskar, Umesh Kumar;Pardoen, Thomas;Raskin, Jean-Pierre
(2010) Nanomechanical Testing Workshop and Hysitron User Meeting — Location: INM, Saarbrücken, Germany (25.February.2010)

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Passi, V., Bhaskar, U. K., Pardoen, T., & Raskin, J.-P. (2010). Application of process induced stress to study the mechanical properties of monocrystalline and amorphous silicon thin films. Proceedings of the Nanomechanical Testing Workshop and Hysitron User Meeting, p. 39-40. https://hdl.handle.net/2078.5/230625