Inverted to normal phase transition in solution-cast polystyrene-poly(methyl methacrylate) block copolymer thin films

Gong, Yumei;Huang, Haiying;Hu, Zhijun;Chen, Yongzhon;He, Tianbai;et.al.
(2006) Macromolecules — n° 39, p. 3369-3376 (2006)

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Authors
  • Gong, YumeiChinese Academy of Sciences, Changchun, China
    Author
  • Huang, HaiyingChinese Academy of Sciences, Changchun, China
    Author
  • Hu, ZhijunUCLouvain
    Author
  • Chen, YongzhonChinese Academy of Sciences, Changchun, China
    Author
  • He, TianbaiChinese Academy of Sciences, Changchun, China
    Author
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Abstract
(en) We have investigated the inverted phase formation and the transition from inverted to normal phase for a cylinder-forming polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer in solution-cast films with thickness about 300 nm during the process of the solution concentrating by slow solvent evaporation. The cast solvent is 1,1,2,2-tetrachloroethane (Tetra-CE), a good solvent for both blocks but having preferential affinity for the minority PMMA block. During such solution concentrating process, the phase behavior was examined by freeze-drying the samples at different evaporation time, corresponding to at different block copolymer concentrations, φ. As φ increases from ∼0.1% (v/v), the phase structure evolved from the disordered sphere phase (DS), consisting of random arranged spheres with the majority PS block as a core and the minority PMMA block as a corona, to ordered inverted phases including inverted spheres (IS), inverted cylinders (IC), and inverted hexagonally perforated lamellae (IHPL) with the minority PMMA block comprising the continuum phase, and then to the lamellar (LAM) phase with alternate layers of the two blocks, and finally to the normal cylinder (NC) phase with the majority PS block comprising the continuum phase. The solvent nature and the copolymer solution concentration are shown to be mainly responsible for the inverted phase formation and the phase transition process.
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Citations

Gong, Y., Huang, H., Hu, Z., Chen, Y., Chen, D., Wang, Z., & He, T. (2006). Inverted to normal phase transition in solution-cast polystyrene-poly(methyl methacrylate) block copolymer thin films. Macromolecules, 39, 3369-3376. https://doi.org/10.1021/ma052380k (Original work published 2006)