Behaviour of CPW and TFMS lines at high temperature for RF applications in sub-45 nm nodes
(2010) Microelectronic Engineering — Vol. 87, n° 3, p. 324-328 (2010)
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Roda Neve, C., Farci, A., Gallitre, M., Blampey, B., Meuris, P., Arnaud, L., & Raskin, J.-P. (2010). Behaviour of CPW and TFMS lines at high temperature for RF applications in sub-45 nm nodes. Microelectronic Engineering, 87(3), 324-328. https://doi.org/10.1016/j.mee.2009.06.021 (Original work published 2010)