TOF-SIMS and XPS Chartacterization of Plasma Etch Residues on Cobalt Silicide Surfaces
(1997) Secondary Ion Mass Spectrometry SIMS X — ISBN: [0-471-95897-2], p. 921-924, published
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Storm, W., Vandervorst, W., Vanhaelemeersch, S., Baklanov, M., Maex, K., Poleunis, C., & Bertrand, P. (1997). TOF-SIMS and XPS Chartacterization of Plasma Etch Residues on Cobalt Silicide Surfaces. In A. Benninghoven, B. Hagenhoff and H. W. Werner (ed.), Secondary Ion Mass Spectrometry SIMS X (p. p. 921-924). John Wiley & Sons. https://hdl.handle.net/2078.5/29074