Silo Isolation Technique - a Study of Active and Parasitic Device Characteristics With Semi-recessed and Fully-recessed Field Oxides

Coppee, JL.;Vandewiele, F.
(1988) Solid-State Electronics — Vol. 31, n° 5, p. 887-891 (1988)

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  • Coppee, JL.
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  • Vandewiele, F.
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Coppee, JL., & Vandewiele, F. (1988). Silo Isolation Technique - a Study of Active and Parasitic Device Characteristics With Semi-recessed and Fully-recessed Field Oxides. Solid-State Electronics, 31(5), 887-891. https://doi.org/10.1016/0038-1101(88)90042-1 (Original work published 1988)