Modeling of shock wave emission during acoustically-driven cavitation-induced cleaning processes
(2006) 8th International Symposium on Ultra-Clean Processing of Semiconductor Surfaces — Location: Antwerp (2006)
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Minsier, V., & Proost, J. (2006). Modeling of shock wave emission during acoustically-driven cavitation-induced cleaning processes. Proceedings, p. 149. https://hdl.handle.net/2078.5/221917