A comparative study of three anisotropic etchants for silicon

Declercq, M.J.;De Moor, J.P.;Lambert, J.P.
(1975) Electrochemical Society Fall Meeting (Extended abstracts only received) — Location: Dallas, TX, USA (5.October.1975)

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  • Declercq, M.J.
    Author
  • De Moor, J.P.
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  • Lambert, J.P.
    Author
Abstract
Experimental results obtained with three etching solutions, respectively the hydrazine-water, the ethylene diamine-pyrocatechol-water, and the potassium hydroxide-isopropylalcohol-water solution are compared.
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Declercq, M. J., De Moor, J. P., & Lambert, J. P. (1975). A comparative study of three anisotropic etchants for silicon. Electrochemical Society Fall Meeting (Extended abstracts only received), p. 446-448. https://hdl.handle.net/2078.5/220458