We report on a novel protocol for patterning the semiconducting polyaniline with an unprecedented areal patterning density exceeding 0.25 teradot/inch2. A simple two-step process is put forward to hierarchically build a large variety of tridimensional functional nanostructures on virtually any type of substrate. Using template confined growth through platinumcatalyzed electroless growth, highly-ordered arrays of distinct polyaniline nanowires are produced with a typical diameter of 15 nm and aspect ratio higher than 20. Up-scaling is straightforward. Complex three-dimensional structural control is achieved through a direct pattern transfer using a novel type of resist- and dose-modulated electron beamlithography. The method is scalable, provides a generic approach for nano- 200 nm 100 nm Figure 1: Transmission electron micrograph of a selfassembled fragment. Inset: Close-up on a single modulated nanopillar. The inner diameter is constant while the outer modulations are gradually widened induced radial alignment of the main nanopillar axis. patterning surfaces with functional polymers and opens the way for design and technological implementation for a large variety of applications covering high-density data storage, vertical nanoelectronics, electric field or light emitters, advanced photonic crystal devices and biomedical implementations. Nanoscale aspects of the growth mechanismare discussed and highly controllable, sub-picogram scale fabrication is emphasized. Bottom-up and top-down paradigms are converged to grow single nanoscale polyaniline elements with an unseen structural and positional control [1].